Wide-spectrum contact lithography machine suitable for mass production of 1.5μm integrated circuit. It is mainly used for quality control of mass production of wide spectrum photoresist.
It is suitable for 500nm/650nm integrated circuit mass production G-line step projection lithography machine. It is mainly used for quality control of mass production G-LINE photoresist and research and test of new products.
It is suitable for I - line step projection lithography machine whose CD line width is no more than 0.35μm. It is mainly used for quality control of mass production I-LINE photoresist and research and test of new products.
ARF immersion lithography machine, numerical aperture (NA) up to 1.35, suitable for mass production of logic devices up to 32nm and storage devices up to 40nm.
Suitable for Krf scanner exposure machine with 110nm CD line width integrated circuit. Mainly used for mass production of Krf photoresist quality control and new product development.
Applicable to 150mm of various materials processing I line, 248 nm, and 193 nm process capacity of automatic glue homogenating, developing function, stacked structure multi-layer heat treatment module, compact structure, high productivity, high reliability
Scanning electron microscope is used for the inspection of the line width of fine lines after exposure etching. It has the technical functions of automatic pattern recognition, diameter detection and automatic analysis of multiple items, which is much higher than the magnification of light microscope.
The Hitachi S4800 cold-field emission scanning electron microscope uses a half internal lens design, and the new objective lens uses a patented EXB design. The single detector and super EXB can be used to collect and separate the signals of simple secondary electrons, mixed secondary electrons and backscattered electrons respectively, which can meet the requirements of high resolution observation of different samples, and is a necessary tool for nanoscale research.
The photoresist development analysis is the most advanced 18 channel development speed analysis and evaluation device, which can evaluate the development speed of photoresist.
It is an open shelf exposure device for experimental use, used with LTJ-RDA-790. With HG-XE lamp, the filter can be used for 248nm, 365nm, 436nm and other wavelengths of exposure.
Applicable to 150mm of various materials processing I line, 248 nm, and 193 nm process capacity of automatic glue homogenating, developing function, stacked structure multi-layer heat treatment module, compact structure, high productivity, high reliability
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Technical：EEEKEJI
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Copyright ? 2012-2025 Ruihong (Suzhou) Electronic Chemicals Co., LTD
Technical：EEEKEJI
0512-69217666